Nature CommunicationsBiochemistryPeer-reviewed journal article
Structural basis of gap-filling DNA synthesis in the nucleosome by DNA Polymerase β
Tyler WeaveriD, Benjamin J. RyaniD, Spencer H. ThompsoniD, Adil S. Hussen, Jonah J. Spencer, Zhen XuiD, Nicholas SchnickeriD, Bret FreudenthaliD
Abstract
Single-strand breaks (SSBs) are one of the most prevalent forms of DNA damage found in the chromatinized genome and are repaired by direct single-strand break repair (SSBR) or base excision repair (BER). DNA polymerase beta (Pol {beta}) is the primary enzyme responsible for processing the 1-nt gap intermediate in chromatin during SSBR and BER. However, the mechanism used by Pol {beta} to process a 1-nt gap in the context of the nucleosome and chromatin remains poorly understood. Here, we use biochemical assays and cryogenic electron microscopy (cryo-EM) to determine the kinetic and structural basis of gap-filling DNA synthesis in the nucleosome by Pol {beta}. Kinetic analysis identified that gap-filling DNA synthesis in the nucleosome by Pol {beta} is position-dependent, where solvent exposed 1-nt gaps are processed more efficiently than histone-occluded 1-nt gaps. A series of cryo-EM structures of Pol {beta} bound to a solvent-exposed 1-nt gap in the nucleosome reveal a global DNA sculpting mechanism for 1-nt gap recognition, which is mediated by sequential engagement of the Pol {beta} lyase domain and polymerase domain. Finally, cryo-EM structures of Pol {beta} bound to 1-nt gaps at two additional positions in the nucleosomal DNA define the structural basis for position-dependent nucleotide insertion in the nucleosome. This work establishes the mechanism used by Pol {beta} for processing 1-nt gaps in the nucleosome during SSBR and BER, providing fundamental insight into DNA repair in chromatin.
- assay: cryo-EM
- research focus: chromatin & epigenetic regulation
- research focus: protein folding & dynamics
- approach: experimental assay
- approach: microscopy & imaging analysis
- Citations
- 15
- FWCI
- 4.14
- Field percentile
- top 5%
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